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Application of fully fluorinated cyclic saturated hydrocarbons for highly selective nanoscale silicon dioxide reactive ion etching

dc.contributor.authorYanovich, S.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorOrlov, S.
dc.contributor.authorGushchin, O.
dc.contributor.authorZaitsev, N.
dc.contributor.authorIgnatov, P.
dc.contributor.authorYafarov, R.
dc.date.accessioned2021-10-20T19:13:08Z
dc.date.available2021-10-20T19:13:08Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21877
dc.sourceIIOimport
dc.titleApplication of fully fluorinated cyclic saturated hydrocarbons for highly selective nanoscale silicon dioxide reactive ion etching
dc.typeMeeting abstract
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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