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Demonstration of integrating post-thinning clean and TSV exposure recess etch into a wafer backside thinning process
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Authors
Zhao, Ming
;
Hayakawa, Susumu
;
Nishida, Yoshiteru
;
Jourdain, Anne
;
Tabuchi, Tomotaka
;
Leunissen, Peter
Conference
4th Electronics System Integration Technology Conference - ESTC
Title
Demonstration of integrating post-thinning clean and TSV exposure recess etch into a wafer backside thinning process
Publication type
Proceedings paper
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