Publication:
Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
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1955 since deposited on 2021-10-21
1last month
Acq. date: 2026-04-27
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Statistics
Views
1955 since deposited on 2021-10-21
1last month
Acq. date: 2026-04-27
Citations