Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals

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Authors
Braun, S.; Vos, Rita; Klipp, Andreas; Claes, Martine; Bittner, Christian; Albert, Johan; Horiguchi, Naoto; Struyf, Herbert
Conference
Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS
Title
Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals
Publication type
Proceedings paper
Embargo date
9999-12-31
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