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Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals
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Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals
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Date
2013
Proceedings Paper
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28096.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Braun, S.
;
Vos, Rita
;
Klipp, Andreas
;
Claes, Martine
;
Bittner, Christian
;
Albert, Johan
;
Horiguchi, Naoto
;
Struyf, Herbert
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Views
1874
since deposited on 2021-10-21
1
last month
1
last week
Acq. date: 2025-12-10
Citations