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Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals

dc.contributor.authorBraun, S.
dc.contributor.authorVos, Rita
dc.contributor.authorKlipp, Andreas
dc.contributor.authorClaes, Martine
dc.contributor.authorBittner, Christian
dc.contributor.authorAlbert, Johan
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-21T06:49:48Z
dc.date.available2021-10-21T06:49:48Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22077
dc.sourceIIOimport
dc.titleImplanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage17
dc.source.endpage20
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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