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Towards an improved megasonic cleaning process: influence of surface tension on bubble activity in acoustic fields

dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorBrems, Steven
dc.contributor.authorHauptmann, Marc
dc.contributor.authorLurquin, Jelle
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T06:51:53Z
dc.date.available2021-10-21T06:51:53Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22096
dc.sourceIIOimport
dc.titleTowards an improved megasonic cleaning process: influence of surface tension on bubble activity in acoustic fields
dc.typeProceedings paper
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage173
dc.source.endpage176
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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