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Chemical vapour deposition of Si:C and Si:CP thin films using disilane

dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-21T07:19:47Z
dc.date.available2021-10-21T07:19:47Z
dc.date.issued2013-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22266
dc.sourceIIOimport
dc.titleChemical vapour deposition of Si:C and Si:CP thin films using disilane
dc.typeMeeting abstract
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceE-MRS Fall Meeting
dc.source.conferencedate16/09/2013
dc.source.conferencelocationPoland Warsaw
imec.availabilityPublished - imec


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