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Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

dc.contributor.authorDussart, R.
dc.contributor.authorLefaucheux, P.
dc.contributor.authorTillocher, T.
dc.contributor.authorRanson, P.
dc.contributor.authorBoufnichel, M.
dc.contributor.authorLjazouli, R.
dc.contributor.authorZhang, Liping
dc.contributor.authorMankelevich, Y.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T07:26:03Z
dc.date.available2021-10-21T07:26:03Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22295
dc.sourceIIOimport
dc.titleApplications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing
dc.typeMeeting abstract
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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