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Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

dc.contributor.authorFoubert, Philippe
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorShite, Hideo
dc.contributor.authorShimoaoki, Takeshi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKosugi, Hitoshi
dc.date.accessioned2021-10-21T07:40:11Z
dc.date.available2021-10-21T07:40:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22356
dc.sourceIIOimport
dc.titleTrack processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage86792T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675314
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8679


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