Authors

Foubert, Philippe; Matsunaga, Koichi; Shite, Hideo; Shimoaoki, Takeshi; Nafus, Kathleen; Goethals, Mieke; Van Den Heuvel, Dieter; Hermans, Jan; Hendrickx, Eric; Kosugi, Hitoshi

Conference

Extreme Ultraviolet (EUV) Lithography IV

Title

Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

Publication type

Proceedings paper

Embargo date

9999-12-31