Publication:

Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

Date

2013
Proceedings Paper
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dc.contributor.authorFoubert, Philippe
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorShite, Hideo
dc.contributor.authorShimoaoki, Takeshi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKosugi, Hitoshi
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-21T07:40:11Z
dc.date.available2021-10-21T07:40:11Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22356
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675314
dc.source.beginpage86792T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.title

Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

dc.typeProceedings paper
dspace.entity.typePublication
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