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Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process
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Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Foubert, Philippe
;
Matsunaga, Koichi
;
Shite, Hideo
;
Shimoaoki, Takeshi
;
Nafus, Kathleen
;
Goethals, Mieke
;
Van Den Heuvel, Dieter
;
Hermans, Jan
;
Hendrickx, Eric
;
Kosugi, Hitoshi
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1895
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations
Metrics
Views
1895
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations