Publication:

Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

Date

2013

Proceedings Paper

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Files

26527.pdf 3.04 MB

Author(s)

Foubert, Philippe

;

Matsunaga, Koichi

;

;

Shimoaoki, Takeshi

;

Nafus, Kathleen

;

Goethals, Mieke

;

Van Den Heuvel, Dieter

;

;

Hendrickx, Eric

;

Kosugi, Hitoshi

Statistics

1898 since deposited on 2021-10-21

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Acq. date: 2026-06-01