Understanding the suppressed charge trapping in relaxed- and strained-Ge/SiO2/HfO2 pMOSFETs and implications for the screening of alternative high-mobility substrate/dielectric CMOS gate stacks

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Authors
Franco, Jacopo; Kaczer, Ben; Roussel, Philippe; Mitard, Jerome; Sioncke, Sonja; Witters, Liesbeth; Mertens, Hans; Grasser, Tibor; Groeseneken, Guido
Conference
International Electron Devices Meeting - IEDM
Title
Understanding the suppressed charge trapping in relaxed- and strained-Ge/SiO2/HfO2 pMOSFETs and implications for the screening of alternative high-mobility substrate/dielectric CMOS gate stacks
Publication type
Proceedings paper
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