Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography

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Authors
Fuchimoto, Daisuke; Sakai, H.; Shindo, H.; Izawa, M.; Sugahara, H.; Van de Kerkhove, Jeroen; De Bisschop, Peter
Conference
Metrology, Inspection, and Process Control for Microlithography XXVII
Title
Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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