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Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography

dc.contributor.authorFuchimoto, Daisuke
dc.contributor.authorSakai, H.
dc.contributor.authorShindo, H.
dc.contributor.authorIzawa, M.
dc.contributor.authorSugahara, H.
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-21T07:44:24Z
dc.date.available2021-10-21T07:44:24Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22372
dc.sourceIIOimport
dc.titleMeasurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography
dc.typeProceedings paper
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage86810A
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVII
dc.source.conferencedate25/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1677987
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8681


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