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OPC resist model separability validation after SMO source change

dc.contributor.authorGillijns, Werner
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorRio, David
dc.contributor.authorHsu, Stephen
dc.contributor.authorFeng, Mu
dc.contributor.authorZang, Qiang
dc.contributor.authorLiu, Hua-Yu
dc.date.accessioned2021-10-21T07:52:00Z
dc.date.available2021-10-21T07:52:00Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22401
dc.sourceIIOimport
dc.titleOPC resist model separability validation after SMO source change
dc.typeProceedings paper
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorRio, David
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage86831B
dc.source.conferenceOptical Microlithography XXVI
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1678442
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8683


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