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Improved surface cleaning by in situ hydrogen plasma for amorphous/crystalline silicon heterojunction solar cells

dc.contributor.authorGranata, Stefano
dc.contributor.authorBearda, Twan
dc.contributor.authorDross, Frederic
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-21T07:59:11Z
dc.date.available2021-10-21T07:59:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22426
dc.sourceIIOimport
dc.titleImproved surface cleaning by in situ hydrogen plasma for amorphous/crystalline silicon heterojunction solar cells
dc.typeProceedings paper
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage321
dc.source.endpage324
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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