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DSA as a complementary lithography technique for contact hole patterning

dc.contributor.authorGronheid, Roel
dc.contributor.authorSingh, Arjun
dc.contributor.authorSayan, Safak
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorChan, BT
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-21T08:02:01Z
dc.date.available2021-10-21T08:02:01Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22436
dc.sourceIIOimport
dc.titleDSA as a complementary lithography technique for contact hole patterning
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conferenceEUVL Symposium
dc.source.conferencedate6/10/2013
dc.source.conferencelocationToyama Japan
imec.availabilityPublished - imec


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