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Rectification of EUV-patterned contact holes using directed self-assembly

dc.contributor.authorGronheid, Roel
dc.contributor.authorSingh, Arjun
dc.contributor.authorYounkin, Todd
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorNealey, Paul
dc.contributor.authorChan, BT
dc.contributor.authorNafus, Kathleen
dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorSomervell, Mark
dc.date.accessioned2021-10-21T08:02:19Z
dc.date.available2021-10-21T08:02:19Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22437
dc.sourceIIOimport
dc.titleRectification of EUV-patterned contact holes using directed self-assembly
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.beginpage86820A
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXX
dc.source.conferencedate25/02/2013
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8682


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