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Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program

dc.contributor.authorHendrickx, Eric
dc.contributor.authorGronheid, Roel
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorFoubert, Philippe
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-21T08:12:18Z
dc.date.available2021-10-21T08:12:18Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22473
dc.sourceIIOimport
dc.titleReadiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewyes
dc.source.conferenceInternational Conference of Photopolymer Science and Technology - ICPST-30
dc.source.conferencedate25/06/2013
dc.source.conferencelocationChiba Japan
imec.availabilityPublished - imec


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