Towards manufacturing a 10nm node device with complementary EUV lithography

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Authors
Hermans, Jan; Dai, Huixiong; Niroomand, Ardavan; Laidler, David; Mao, Ming; Chen, Yongmei; Leray, Philippe; Ngai, Chris; Cheng, Shaunee
Conference
Extreme Ultraviolet (EUV) Lithography IV
Title
Towards manufacturing a 10nm node device with complementary EUV lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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