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Mitigation of plasma-induced damage of advanced 2.0 porous dielectrics by the pore stuffing approach

dc.contributor.authorHeyne, Markus
dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGronheid, Roel
dc.contributor.authorWilson, Chris
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T08:16:12Z
dc.date.available2021-10-21T08:16:12Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22487
dc.sourceIIOimport
dc.titleMitigation of plasma-induced damage of advanced 2.0 porous dielectrics by the pore stuffing approach
dc.typeMeeting abstract
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorWilson, Chris
dc.source.peerreviewno
dc.source.beginpage114
dc.source.conferenceAVS 60th International Symposium & Exhibition
dc.source.conferencedate27/10/2013
dc.source.conferencelocationLong Beach, CA USA
dc.identifier.urlhttp://www2.avs.org/symposium/avs60/pdfs/abstractbook.pdf
imec.availabilityPublished - imec
imec.internalnotesAbstract #3305


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