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Low temperature pre-epi Treatment: critical parameters to control interface contamination

dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorWostyn, Kurt
dc.contributor.authorRosseel, Erik
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorProfijt, Harald
dc.contributor.authorTolle, John
dc.date.accessioned2021-10-21T08:17:05Z
dc.date.available2021-10-21T08:17:05Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22490
dc.sourceIIOimport
dc.titleLow temperature pre-epi Treatment: critical parameters to control interface contamination
dc.typeMeeting abstract
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceE-MRS Fall Meeting Symposium A: Alternative Semiconductor Integration in Si Microelectronics
dc.source.conferencedate16/09/2013
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - open access


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