Double patterning with dual hard mask for 28nm node devices and below

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Authors

Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner

ISSN

1537-1646

Issue

4

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Volume

12

Title

Double patterning with dual hard mask for 28nm node devices and below

Publication type

Journal article

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