Wet removal of post-etch residues by a combination of UV irradiation and a SC1 process

Thumbnail
Metadata
Show full item record
Authors
Kesters, Els; Le, Quoc Toan; Simms, Ihsan; Nafus, Kathleen; Struyf, Herbert; De Gendt, Stefan
Conference
Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS
Title
Wet removal of post-etch residues by a combination of UV irradiation and a SC1 process
Publication type
Proceedings paper
Collections