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Wet removal of post-etch residues by a combination of UV irradiation and a SC1 process

dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorSimms, Ihsan
dc.contributor.authorNafus, Kathleen
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T08:44:11Z
dc.date.available2021-10-21T08:44:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22579
dc.sourceIIOimport
dc.titleWet removal of post-etch residues by a combination of UV irradiation and a SC1 process
dc.typeProceedings paper
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage114
dc.source.endpage118
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 195


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