Publication:
Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1857 since deposited on 2021-10-21
2last month
1last week
Acq. date: 2025-12-16
Citations
Metrics
Views
1857 since deposited on 2021-10-21
2last month
1last week
Acq. date: 2025-12-16
Citations