Publication:

Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry

Date

2013

Proceedings Paper

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Files

26453.pdf 585.32 KB

Author(s)

;

Vandeweyer, Tom

;

Altamirano Sanchez, Efrain

;

Dekkers, Harold

;

Van Besien, Els

;

Tsvetanova, Diana

;

Richard, Olivier

;

;

Boccardi, Guillaume

;

Horiguchi, Naoto

Metrics

1857 since deposited on 2021-10-21

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Acq. date: 2026-01-07