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Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry
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Authors
Kim, Min-Soo
;
Vandeweyer, Tom
;
Altamirano Sanchez, Efrain
;
Dekkers, Harold
;
Van Besien, Els
;
Tsvetanova, Diana
;
Richard, Olivier
;
Chew, Soon Aik
;
Boccardi, Guillaume
;
Horiguchi, Naoto
Conference
14th International Conference on Ultimate Integration in Silicon - ULIS
Title
Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry
Publication type
Proceedings paper
Embargo date
9999-12-31
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