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Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry

dc.contributor.authorKim, Min-Soo
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDekkers, Harold
dc.contributor.authorVan Besien, Els
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorRichard, Olivier
dc.contributor.authorChew, Soon Aik
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-21T08:51:43Z
dc.date.available2021-10-21T08:51:43Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22601
dc.sourceIIOimport
dc.titleSelf-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry
dc.typeProceedings paper
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference14th International Conference on Ultimate Integration in Silicon - ULIS
dc.source.conferencedate19/03/2013
dc.source.conferencelocationWarwick UK
imec.availabilityPublished - open access


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