dc.contributor.author | La Manna, Antonio | |
dc.contributor.author | Guo, Wei | |
dc.contributor.author | Van Huylenbroeck, Stefaan | |
dc.contributor.author | Sirignano, Emilio | |
dc.contributor.author | Cherman, Vladimir | |
dc.contributor.author | Van der Plas, Geert | |
dc.contributor.author | De Wachter, Bart | |
dc.contributor.author | Phommahaxay, Alain | |
dc.contributor.author | Jourdain, Anne | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Beyne, Eric | |
dc.date.accessioned | 2021-10-21T09:01:45Z | |
dc.date.available | 2021-10-21T09:01:45Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22630 | |
dc.source | IIOimport | |
dc.title | Study of 3D process impact on advanced CMOS devices | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | La Manna, Antonio | |
dc.contributor.imecauthor | Guo, Wei | |
dc.contributor.imecauthor | Van Huylenbroeck, Stefaan | |
dc.contributor.imecauthor | Cherman, Vladimir | |
dc.contributor.imecauthor | Van der Plas, Geert | |
dc.contributor.imecauthor | De Wachter, Bart | |
dc.contributor.imecauthor | Phommahaxay, Alain | |
dc.contributor.imecauthor | Jourdain, Anne | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.orcidimec | Van Huylenbroeck, Stefaan::0000-0001-9978-3575 | |
dc.contributor.orcidimec | Van der Plas, Geert::0000-0002-4975-6672 | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1 | |
dc.source.endpage | 7 | |
dc.source.conference | European Microelectronics and Packaging Conference - EMPC | |
dc.source.conferencedate | 9/09/2013 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - imec | |