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Surface preparation and cleaning in back-end-of-line for advanced CMOS integrated circuit

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T09:09:11Z
dc.date.available2021-10-21T09:09:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22655
dc.sourceIIOimport
dc.titleSurface preparation and cleaning in back-end-of-line for advanced CMOS integrated circuit
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on Nanotechnology and Application
dc.source.conferencedate14/11/2013
dc.source.conferencelocationVung Tau Viet Nam
imec.availabilityPublished - imec


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