Publication:

Low frequency noise analysis for post-treatment of replacement metal gate FinFET

Date

2013

Journal article

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Author(s)

;

;

Veloso, Anabela

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Arimura, Hiroaki

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Boccardi, Guillaume

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Ragnarsson, Lars-Ake

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Chiarella, Thomas

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Horiguchi, Naoto

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;

Groeseneken, Guido

Journal

IEEE Transactions on Electron Devices

Metrics

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Acq. date: 2026-01-11