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An experimental study of the growth mechanism of TiO2 Atomic Layer Deposition on surface modified nanoporous low-k films

dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorDevloo-Casier, K
dc.contributor.authorDendooven, Jolien
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorDetavernier, Christoph
dc.date.accessioned2021-10-21T09:16:08Z
dc.date.available2021-10-21T09:16:08Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22674
dc.sourceIIOimport
dc.titleAn experimental study of the growth mechanism of TiO2 Atomic Layer Deposition on surface modified nanoporous low-k films
dc.typeMeeting abstract
dc.contributor.imecauthorLevrau, Elisabeth
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage121
dc.source.endpage122
dc.source.conferenceMaterials for Advanced Metallization - MAM
dc.source.conferencedate12/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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