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Epitaxial growth challenges for advanced CMOS devices

dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVincent, Benjamin
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorEneman, Geert
dc.contributor.authorMitard, Jerome
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandooren, Anne
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-21T09:33:11Z
dc.date.available2021-10-21T09:33:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22722
dc.sourceIIOimport
dc.titleEpitaxial growth challenges for advanced CMOS devices
dc.typeProceedings paper
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage165
dc.source.endpage166
dc.source.conference8th International Conference on Si Epitaxy and Heterostructures - ICSI8
dc.source.conferencedate2/06/2013
dc.source.conferencelocationFukuoka Japan
imec.availabilityPublished - open access


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