Show simple item record

Backscattering/channeling study of high dose rare-earth implants in Si

dc.contributor.authorVantomme, Andre
dc.contributor.authorWu, Ming Fang
dc.contributor.authorWahl, U.
dc.contributor.authorPattyn, Hugo
dc.contributor.authorBender, Hugo
dc.contributor.authorLangouche, G.
dc.date.accessioned2021-09-30T09:59:15Z
dc.date.available2021-09-30T09:59:15Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2274
dc.sourceIIOimport
dc.titleBackscattering/channeling study of high dose rare-earth implants in Si
dc.typeOral presentation
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorPattyn, Hugo
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Ion Beam Analysis - IBA; July 1997; Lisboa, Portugal.
dc.source.conferencelocation
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record