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Back-channel-etch process flow for a-IGZO TFTs

dc.contributor.authorNag, Manoj
dc.contributor.authorSteudel, Soeren
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorMyny, Kris
dc.contributor.authorRockele, Maarten
dc.contributor.authorBhoolokam, Ajay
dc.contributor.authorWillegems, Myriam
dc.contributor.authorSmout, Steve
dc.contributor.authorVicca, Peter
dc.contributor.authorAmeys, Marc
dc.contributor.authorSchols, Sarah
dc.contributor.authorGenoe, Jan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-21T10:19:10Z
dc.date.available2021-10-21T10:19:10Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22842
dc.sourceIIOimport
dc.titleBack-channel-etch process flow for a-IGZO TFTs
dc.typeProceedings paper
dc.contributor.imecauthorNag, Manoj
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorMyny, Kris
dc.contributor.imecauthorWillegems, Myriam
dc.contributor.imecauthorSmout, Steve
dc.contributor.imecauthorAmeys, Marc
dc.contributor.imecauthorSchols, Sarah
dc.contributor.imecauthorGenoe, Jan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecMyny, Kris::0000-0002-5230-495X
dc.contributor.orcidimecSmout, Steve::0000-0001-5464-8951
dc.contributor.orcidimecAmeys, Marc::0000-0001-7140-2101
dc.contributor.orcidimecGenoe, Jan::0000-0002-4019-5979
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewyes
dc.source.beginpage285
dc.source.endpage288
dc.source.conferenceEuro Display Conference
dc.source.conferencedate16/09/2013
dc.source.conferencelocationLondon UK
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/sdtp.83/abstract
imec.availabilityPublished - imec


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