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UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
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Authors
Li, Li
;
Alay, Josep Lluis
;
Mertens, Paul
;
Meuris, Marc
;
Vandervorst, Wilfried
;
Heyns, Marc
;
De Blank, Rene
;
Schuivens, Eugene
Conference
Proceedings 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
Title
UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
Publication type
Proceedings paper
Embargo date
9999-12-31
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