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Actinic characterization and modeling of the EUV mask stack

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorJonckheere, Rik
dc.contributor.authorDavydova, Natalia
dc.contributor.authorFliervoet, Timon
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-21T10:56:50Z
dc.date.available2021-10-21T10:56:50Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22934
dc.sourceIIOimport
dc.titleActinic characterization and modeling of the EUV mask stack
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewyes
dc.source.beginpage88860B
dc.source.conference29th European Mask and Lithography Conference
dc.source.conferencedate25/06/2013
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1746540
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8886


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