Authors

Pollentier, Ivan; Lokasani, Ragava; Gronheid, Roel; Hill, S.; Tarrio, C.; Lucatorto, T.

Conference

Extreme Ultraviolet (EUV) Lithography IV

Title

Relationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV

Publication type

Proceedings paper

Embargo date

9999-12-31