Show simple item record

Relationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV

dc.contributor.authorPollentier, Ivan
dc.contributor.authorLokasani, Ragava
dc.contributor.authorGronheid, Roel
dc.contributor.authorHill, S.
dc.contributor.authorTarrio, C.
dc.contributor.authorLucatorto, T.
dc.date.accessioned2021-10-21T11:02:08Z
dc.date.available2021-10-21T11:02:08Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22946
dc.sourceIIOimport
dc.titleRelationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage86790K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675249
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8679


Files in this item

Thumbnail
Name:
26402.pdf
Size:
1.461Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record