dc.contributor.author | Popovici, Mihaela Ioana | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Aoulaiche, Marc | |
dc.contributor.author | Redolfi, Augusto | |
dc.contributor.author | Kaczer, Ben | |
dc.contributor.author | Kim, Min-Soo | |
dc.contributor.author | Douhard, Bastien | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Clima, Sergiu | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Van Elshocht, Sven | |
dc.date.accessioned | 2021-10-21T11:03:33Z | |
dc.date.available | 2021-10-21T11:03:33Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22949 | |
dc.source | IIOimport | |
dc.title | Advanced dielectrics targeting 2X DRAM MIM capacitors | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Popovici, Mihaela Ioana | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Redolfi, Augusto | |
dc.contributor.imecauthor | Kaczer, Ben | |
dc.contributor.imecauthor | Kim, Min-Soo | |
dc.contributor.imecauthor | Douhard, Bastien | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Clima, Sergiu | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
dc.contributor.orcidimec | Kim, Min-Soo::0000-0003-0211-0847 | |
dc.contributor.orcidimec | Clima, Sergiu::0000-0002-4044-9975 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 143 | |
dc.source.endpage | 152 | |
dc.source.conference | Atomic Layer Deposition Applications 9 | |
dc.source.conferencedate | 27/10/2013 | |
dc.source.conferencelocation | San Francisco, CA USA | |
dc.identifier.url | http://ecst.ecsdl.org/content/58/10/143.full.pdf+html?sid=8e4810f2-6b37-45b2-9e27-35b064120d2e | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol.58, Issue 10 | |