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1-D model of RF CCP discharge in Ar/CF4/CF3I gas mixtures

dc.contributor.authorProshina, Olga
dc.contributor.authorRakhimova, Tatyana
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T11:07:36Z
dc.date.available2021-10-21T11:07:36Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22959
dc.sourceIIOimport
dc.title1-D model of RF CCP discharge in Ar/CF4/CF3I gas mixtures
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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