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1-D model of OSG low-k films modification by EUV/VUV emission

dc.contributor.authorRakhimova, T.V.
dc.contributor.authorRakhimov, A.T.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorZiryanov, S.M.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorVasil'eva, A.N.
dc.contributor.authorProshina, O.V.
dc.contributor.authorBraginsky, O.V.
dc.contributor.authorKurchikov, K.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T11:15:41Z
dc.date.available2021-10-21T11:15:41Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22977
dc.sourceIIOimport
dc.title1-D model of OSG low-k films modification by EUV/VUV emission
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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