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Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
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1927 since deposited on 2021-10-21
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Acq. date: 2025-10-24
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Views
1927 since deposited on 2021-10-21
420item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations