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UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning

dc.contributor.authorLi, Li
dc.contributor.authorAlay, Josep Lluis
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Blank, Rene
dc.contributor.authorSchuivens, Eugene
dc.date.accessioned2021-09-29T12:43:04Z
dc.date.available2021-09-29T12:43:04Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/229
dc.sourceIIOimport
dc.titleUV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Blank, Rene
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage163
dc.source.endpage166
dc.source.conferenceProceedings 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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