Show simple item record

dc.contributor.authorLi, Li
dc.contributor.authorAlay, Josep Lluis
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Blank, Rene
dc.contributor.authorSchuivens, Eugene
dc.date.accessioned2021-09-29T12:43:04Z
dc.date.available2021-09-29T12:43:04Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/229
dc.sourceIIOimport
dc.titleUV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Blank, Rene
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage163
dc.source.endpage166
dc.source.conferenceProceedings 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


Files in this item

Thumbnail

This item appears in the following collection(s)

Show simple item record