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Ni(Pt) silicide with improved thermal stability for application in DRAM PERI or RMG devices

dc.contributor.authorSchram, Tom
dc.contributor.authorSpessot, Alessio
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorRosseel, Erik
dc.contributor.authorCaillat, Christian
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorFazan, Pierre
dc.date.accessioned2021-10-21T11:49:54Z
dc.date.available2021-10-21T11:49:54Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23053
dc.sourceIIOimport
dc.titleNi(Pt) silicide with improved thermal stability for application in DRAM PERI or RMG devices
dc.typeMeeting abstract
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorFazan, Pierre
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage189
dc.source.endpage190
dc.source.conferenceMaterials for Advanced Metallization - MAM
dc.source.conferencedate10/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesP7-11


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