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Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue
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Authors
Sebaai, Farid
;
Veloso, Anabela
;
Takahashi,
;
Pacco, Antoine
;
Claes, Martine
;
Schaekers, Marc
;
De Gendt, Stefan
;
Mertens, Paul
;
Struyf, Herbert
Conference
Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS
Title
Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue
Publication type
Proceedings paper
Embargo date
9999-12-31
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