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Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue

dc.contributor.authorSebaai, Farid
dc.contributor.authorVeloso, Anabela
dc.contributor.authorTakahashi,
dc.contributor.authorPacco, Antoine
dc.contributor.authorClaes, Martine
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-21T11:54:54Z
dc.date.available2021-10-21T11:54:54Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23064
dc.sourceIIOimport
dc.titleDummy oxide removal in high-K last process integration how to avoid silicon corrosion issue
dc.typeProceedings paper
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage13
dc.source.endpage16
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2013
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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