Publication:

CVD Mn-based self-formed barrier for advanced interconnect technology

Date

2013

Proceedings Paper

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Files

26116.pdf 804.6 KB

Author(s)

Siew, Yong Kong

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Jourdan, Nicolas

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Barbarin, Yohan

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Machillot, Jerome

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Demuynck, Steven

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Cockburn, Andrew

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Boemmels, Juergen

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Metrics

1990 since deposited on 2021-10-21

Acq. date: 2026-01-07