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Nano goes macro - Nanoimprint lithography at the transition from small to large-area production

dc.contributor.authorStadlober, Barabara
dc.contributor.authorNees, Dieter
dc.contributor.authorLintschnig, Andre
dc.contributor.authorBelegratis, Maria
dc.contributor.authorGold, Herbert
dc.contributor.authorHaase, Anja
dc.contributor.authorFian, Alexander
dc.contributor.authorSchindler, Axel
dc.contributor.authorDrost, Andreas
dc.contributor.authorKoenig, Martin
dc.contributor.authorZanella, Frederic
dc.contributor.authorMarjanovic, Nenad
dc.contributor.authorRing, Johan
dc.contributor.authorLee, Ki-Dong
dc.contributor.authorMuller, Robert
dc.contributor.authorGenoe, Jan
dc.contributor.authorHirshy, Hassan
dc.contributor.authorPretot, Roger
dc.date.accessioned2021-10-21T12:19:22Z
dc.date.available2021-10-21T12:19:22Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23116
dc.sourceIIOimport
dc.titleNano goes macro - Nanoimprint lithography at the transition from small to large-area production
dc.typeOral presentation
dc.contributor.imecauthorGenoe, Jan
dc.contributor.orcidimecGenoe, Jan::0000-0002-4019-5979
dc.source.peerreviewno
dc.source.conferenceMRS Fall Meeting Symposium M: Large-Area Processing and Patterning for Active Optical and Electronic Devices
dc.source.conferencedate1/12/2013
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec


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