Publication:

Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for advanced interconnects

Date

2013
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Author(s)

Swerts, Johan  
;
Siew, Yong Kong  
;
Van Besien, Els  
;
Barbarin, Yohan
;
Boemmels, Juergen  
;
Tokei, Zsolt  
;
Van Elshocht, Sven  

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