Publication:
Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for advanced interconnects
Date
Loading...
Files
Journal
Abstract
Description
Statistics
Views
1833 since deposited on 2021-10-21
Acq. date: 2026-02-26
Citations
Statistics
Views
1833 since deposited on 2021-10-21
Acq. date: 2026-02-26
Citations